Pulsed Laser Deposition Laboratory

History:

PLD is a thin film deposition technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material to be deposited on a substrate facing the target. PLD can create thin films of a wide range of materials, including semiconductors, metals and insulators with excellent adhesion. The goal of PLD laboratory is to be creative in the area of applied materials physics and experimental condensed-matter physics. The instrument is purchased under DST-FIST program in 2016.

Research areas:

Metal oxide thin film growth (TiO2) and their heterostructures for resistive switching/ memristor devices.

Superconducting materials synthesis (YBCO) on different substrates for fundamental understanding of the superconductivity phenomenon at the interface.

Resources and facilities:

Pulsed laser deposition system (248 nm KrF excimer laser by Compaq 102 F model) comprising of vacuum chamber with Rotary and turbo pump for sample growth alongwith stepper motor and oxygen, Argon, KrF gas cylinders.

Achievements:

Since inception of this laboratory, parameter optimization for TiO2 thin film growth on different substrates for M.Sc. student project work. The structural, surface morphological and optical characterization is studied.

Contact persons: Dr. Rajeshkumar S. Hyam